Preliminary program

Friday, December 13, 2019

08:00

09:00

10:00

11:00

12:00

13:00

14:00

›8:30 (20min)

Coffee break

›9:25 (05min)

Dry Etching Process Discussions
Chair Laurence Ferlazzo

›9:35 (20min)

Dry etching requirements for active nanophotonic structures made of III-V semiconductors - Rémy Braive
Rémy Braive

›9:55 (20min)

Plasma Etching of Ultra Nano Crystalline Diamond - Andrei Avram
Andrei Avram

›10:30 (20min)

Coffee break

›10:50 (15min)

Dry Etching Process Discussions
Chair Dmitri Yarekha

›11:05 (25min)

Resist mask selectivity during BOSCH process - Dmitri Yarekha
Dmitri Yarekha

›11:30 (15min)

Black silicon and deep silicon etch (1000 µm) - Thomas Marthinsen
Thomas Marthinsen

›12:15 (30min)

Evolution of the EuroNanLab sessions.
Meint Deboer

›12:45 (1h15)

Lunch / End of the meeting

Session

Speech

Logistics

Break

Tour

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