EuronanoLab Paris 2019
12-13 Dec 2019 PALAISEAU (France)
Login
Lost password ?
Create account
Home
Registration/Hotels
▼
Registration
Hotels
Oral and Poster upload
▼
Submission/upload procedure
Submission for Posters and Oral
Preliminary program
Map/Location/Informations
Preliminary program
Thu. 12
Fri. 13
08:00
09:00
10:00
11:00
12:00
13:00
14:00
15:00
16:00
17:00
18:00
19:00
20:00
21:00
22:00
23:00
Welcome reception
8:30 - 8:55 (25min)
Welcome reception
Activities and projects of the Renatech & EuroNanoLab nanofabrication networks - Michel de Labachelerie
9:00 - 9:40 (40min)
Activities and projects of the Renatech & EuroNanoLab nanofabrication networks - Michel de Labachelerie
Michel de Labachelerie
C2N Lab and nanofabrication facilities - Benoit Belier
9:45 - 10:05 (20min)
C2N Lab and nanofabrication facilities - Benoit Belier
Benoit Belier
Datas for EuroNanoLab Database, what to do ? how to ? - Christiaan Bruinik
10:10 - 11:00 (50min)
Datas for EuroNanoLab Database, what to do ? how to ? - Christiaan Bruinik
Christiaan Bruinik
Coffee break
11:00 - 11:30 (30min)
Coffee break
Lab presentation: Dry Etching Machines
11:30 - 12:30 (1h)
Lab presentation: Dry Etching Machines
Chair Meint Deboer
Lunch / Poster session : EuroNanoLab facilities & Dry etching machines
12:30 - 14:00 (1h30)
Lunch / Poster session : EuroNanoLab facilities & Dry etching machines
Pilot verification tests for etch tools - Meint Deboer
14:00 - 14:55 (55min)
Pilot verification tests for etch tools - Meint Deboer
Meint Deboer
Commercial and AfterSale issues
15:00 - 15:30 (30min)
Commercial and AfterSale issues
Stephane
Dry etching machines dedicated to specific material issues
15:35 - 16:05 (30min)
Dry etching machines dedicated to specific material issues
Stéphane
Coffee break / Poster session: Dry etching machines
16:05 - 16:30 (25min)
Coffee break / Poster session: Dry etching machines
Lab and CleanRoom Visit
16:30 - 18:00 (1h30)
Lab and CleanRoom Visit
Tour in Paris and Dinner
20:30 - 23:00 (2h30)
Tour in Paris and Dinner
*
Coffee break
8:30 - 8:50 (20min)
Coffee break
Dry Etching Process Discussions
9:25 - 9:30 (05min)
Dry Etching Process Discussions
Chair Laurence Ferlazzo
Dry etching requirements for active nanophotonic structures made of III-V semiconductors - Rémy Braive
9:35 - 9:55 (20min)
Dry etching requirements for active nanophotonic structures made of III-V semiconductors - Rémy Braive
Rémy Braive
Plasma Etching of Ultra Nano Crystalline Diamond - Andrei Avram
9:55 - 10:15 (20min)
Plasma Etching of Ultra Nano Crystalline Diamond - Andrei Avram
Andrei Avram
Coffee break
10:30 - 10:50 (20min)
Coffee break
Dry Etching Process Discussions
10:50 - 11:05 (15min)
Dry Etching Process Discussions
Chair Dmitri Yarekha
Resist mask selectivity during BOSCH process - Dmitri Yarekha
11:05 - 11:30 (25min)
Resist mask selectivity during BOSCH process - Dmitri Yarekha
Dmitri Yarekha
Black silicon and deep silicon etch (1000 µm) - Thomas Marthinsen
11:30 - 11:45 (15min)
Black silicon and deep silicon etch (1000 µm) - Thomas Marthinsen
Thomas Marthinsen
Evolution of the EuroNanLab sessions.
12:15 - 12:45 (30min)
Evolution of the EuroNanLab sessions.
Meint Deboer
Lunch / End of the meeting
12:45 - 14:00 (1h15)
Lunch / End of the meeting
Online user:
15
Privacy
Loading...